The light-sensitive materials utilised in many industrial operations are known as photoresist compounds. When exposed to UV light, it changes its chemical structure and is extensively employed in photolithography and photoengraving to generate a regular coating on a surface. It is also required in the semiconductor manufacturing process. Positive and negative photoresists are the two types of photoresists. Dry film and liquid photoresists are both available. Polymethyl methacrylate, polymethyl glutarimide, and phenol-formaldehyde resin are among the chemicals used in photoresists. Photoresist chemicals are employed in semiconductors, as a silicon etching agent for micro-electro-mechanical systems, and as an alkali cleaner for electronic devices.
These compounds are employed because of their unique properties, which include high purity, microprocessability, and crisp patterning and etching on substrates. The rising demand for dynamic display technology, together with the developing trend in the electronics and semiconductor sector, is driving the expansion of the photoresist chemical market. However, the market expansion of photoresist chemicals is hampered by environmental and occupational health issues.
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